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Effect of Hot-Filament Annealing in a Hydrogen Atmosphere on the Electrical and Structural Properties of Nb-Doped Tio2 Sputtered Thin Films

AuthID
P-002-DSQ

Author(s)

Tavares, CJ

Castro, MV

Marins, ES

Benelmekki, M

Xuriguera, E

Riviere, JP

Eyidi, D

Beaufort, MF

Mendes, A

Document Type

Article

Year published

2012

Published

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 520, Issue: 7, Pages: 2514-2519 (6)

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Publication Identifiers

DOI: 10.1016/j.tsf.2011.10.031

Handle: https://hdl.handle.net/1822/21806

Scopus: 2-s2.0-84856390740

Wos: WOS:000301085100022

Source Identifiers

ISSN: 0040-6090

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Effect of Hot-Filament Annealing in a Hydrogen Atmosphere on the Electrical and Structural Properties of Nb-Doped Tio2 Sputtered Thin Films

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Effect of Hot-Filament Annealing in a Hydrogen Atmosphere on the Electrical and Structural Properties of Nb-Doped Tio2 Sputtered Thin Films

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