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Effect of Substrate Bias Voltage on the Physical Properties of Dc Reactive Magnetron Sputtered Nio Thin Films

AuthID
P-002-V4D

Author(s)

Reddy, AM

Reddy, AS

Reddy, PS

Document Type

Article

Year published

2011

Published

in MATERIALS CHEMISTRY AND PHYSICS, ISSN: 0254-0584

Volume: 125, Issue: 3, Pages: 434-439 (6)

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Publication Identifiers

DOI: 10.1016/j.matchemphys.2010.10.035

Scopus: 2-s2.0-78650029368

Wos: WOS:000286904800021

Source Identifiers

ISSN: 0254-0584

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Effect of Substrate Bias Voltage on the Physical Properties of Dc Reactive Magnetron Sputtered Nio Thin Films

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