Effect of Annealing and Electrical Properties of High-Kappa Thin Films Grown by Atomic Layer Deposition Using Carboxylic Acids as Oxygen Source

AuthID
 P-003-R4T
6
Author(s)
Ducroquet, F
·
Matko, I
·
Document Type
Article
Year published
2009
Published
in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, ISSN: 1071-1023
Volume: 27, Issue: 1, Pages: 230-235 (6)
Conference
15Th Workshop on Dielectrics in Microelectronics (Wodim 2008), Date: JUN 23-25, 2008, Location: Bad Saarow, GERMANY, Sponsors: Amer Vacuum Soc, German State Brandenburg, Minist Sci, Res & Educ, AIXTRON AG, DCA Instruments Oy, Keithley Instruments, Omicron Nano Technol GmbH, Siltronic AG, SPECS GmbH, STAIB Instrumente GmbH, SUSS MicroTec AG
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Publication Identifiers
Scopus: 2-s2.0-59949103945
Wos: WOS:000265839000045
Source Identifiers
ISSN: 1071-1023
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