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Corrigendum to “Nickel Assisted Metal Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer” [Thin Solid Films 511–512 (2006) 275–279]

AuthID
P-00H-EGB

Author(s)

Pereira, L

Martins, R

Schell, N

Fortunato, E

Martins, R

Document Type

Article

Year published

2007

Published

in Thin Solid Films, ISSN: 0040-6090

Volume: 516, Issue: 1, Pages: 104-105

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Publication Identifiers

DOI: 10.1016/j.tsf.2007.06.001

Source Identifiers

ISSN: 0040-6090

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Corrigendum to “Nickel Assisted Metal Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer” [Thin Solid Films 511–512 (2006) 275–279]

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Corrigendum to “Nickel Assisted Metal Induced Crystallization of Silicon: Effect of Native Silicon Oxide Layer” [Thin Solid Films 511–512 (2006) 275–279]

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