351
TITLE: RBS/simulated annealing analysis of silicide formation in Fe/Si systems  Full Text
AUTHORS: Barradas, NP ; Jeynes, C; Homewood, KP; Sealy, BJ; Milosavljevic, M;
PUBLISHED: 1998, SOURCE: 5th European Conference on Accelerators in Applied Research and Technology (ECAART5) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 139, ISSUE: 1-4
INDEXED IN: Scopus WOS CrossRef
352
TITLE: Residual post anneal damage of Ge and C co-implantation of Si determined by quantitative RBS-channelling  Full Text
AUTHORS: Nejim, A; Barradas, NP ; Jeynes, C; Cristiano, F; Wendler, E; Gartner, K; Sealy, BJ;
PUBLISHED: 1998, SOURCE: 5th European Conference on Accelerators in Applied Research and Technology (ECAART5) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 139, ISSUE: 1-4
INDEXED IN: Scopus WOS CrossRef
353
TITLE: The RBS data furnace: Simulated annealing  Full Text
AUTHORS: Barradas, NP ; Marriott, PK; Jeynes, C; Webb, RP;
PUBLISHED: 1998, SOURCE: 13th International Conference on Ion Beam Analysis (IBA-13) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 136
INDEXED IN: Scopus WOS CrossRef
354
TITLE: Alpha-elastic recoil detection analysis of the energy distribution of oxygen ions implanted into silicon with plasma immersion ion implantation  Full Text
AUTHORS: Barradas, NP ; Maas, AJH; Mandl, S; Gunzel, R;
PUBLISHED: 1997, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 81, ISSUE: 10
INDEXED IN: Scopus WOS CrossRef
355
TITLE: Comparison of computer generated and ERDA depth profiles of oxygen implanted into silicon with plasma immersion ion implantation  Full Text
AUTHORS: Barradas, NP ; Maas, AJH; Mandl, S;
PUBLISHED: 1997, SOURCE: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 124, ISSUE: 1
INDEXED IN: Scopus WOS CrossRef
356
TITLE: Comparison of measured and calculated dose for plasma source ion implantation into 3-D objects  Full Text
AUTHORS: Mandl, S; Barradas, NP ; Brutscher, J; Gunzel, R; Moller, W;
PUBLISHED: 1997, SOURCE: 10th International Conference on Ion Beam Modification of Materials (IBMM-96) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 127
INDEXED IN: Scopus WOS
357
TITLE: Formation of ternary (Fe1-xCox)Si-2 structures by ion beam assisted deposition and ion implantation  Full Text
AUTHORS: Wieser, E; Panknin, D; Barradas, NP ; Betzl, M; Reuther, H; Henrion, W; Lange, H;
PUBLISHED: 1997, SOURCE: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 124, ISSUE: 4
INDEXED IN: Scopus WOS CrossRef
358
TITLE: Influence of the ion irradiation on the properties of beta-FeSi2 layers prepared by ion beam assisted deposition  Full Text
AUTHORS: Barradas, NP ; Panknin, D; Wieser, E; Schmidt, B; Betzl, M; Mucklich, A; Skorupa, W;
PUBLISHED: 1997, SOURCE: 10th International Conference on Ion Beam Modification of Materials (IBMM-96) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 127
INDEXED IN: Scopus WOS CrossRef
359
TITLE: Short pulse plasma immersion ion implantation of oxygen into silicon: determination of the energy distribution  Full Text
AUTHORS: Barradas, NP ; Maas, AJH; Mandl, S; Gunzel, R;
PUBLISHED: 1997, SOURCE: 3rd International Workshop on Plasma-Based Ion Implantation in SURFACE & COATINGS TECHNOLOGY, VOLUME: 93, ISSUE: 2-3
INDEXED IN: Scopus WOS CrossRef
360
TITLE: Simulated annealing analysis of Rutherford backscattering data  Full Text
AUTHORS: Barradas, NP ; Jeynes, C; Webb, RP;
PUBLISHED: 1997, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 71, ISSUE: 2
INDEXED IN: Scopus WOS CrossRef
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