Elvira Maria Correia Fortunato


AuthID: R-000-4M5

Confirmed Publications: 950



821
TITLE: Performances of an optical ruler based on one-dimensional hydrogenated amorphous Si position-sensitive detectors produced using different metal contacts  Full Text
AUTHORS: Fortunato, E ; Teodoro, P; Silva, V; Ferreira, I ; Nunes, Y ; Guimaraes, N; Soares, F; Giuliani, F; Popovic, G; Brener, W; Martins, R ;
PUBLISHED: 2000, SOURCE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
INDEXED IN: Scopus CrossRef
IN MY: ORCID | CIÊNCIAVITAE
822
823
TITLE: Plasma diagnostics of a PECVD system using different RF electrode configurations  Full Text
AUTHORS: Aguas, H ; Martins, R ; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-MRS Spring Meeting in VACUUM, VOLUME: 56, ISSUE: 1
INDEXED IN: Scopus WOS
IN MY: ORCID | ResearcherID | CIÊNCIAVITAE
824
TITLE: Production of low cost contacts and joins for large area devices by electrodeposition of Cu and Sn  Full Text
AUTHORS: Ferreira, J; Seiroco, H; Fernandes, FB ; Martins, R ; Fortunato, E ; Marvao, AP; Martins, JI ;
PUBLISHED: 2000, SOURCE: Spring Meeting of the European-Materials-Research-Society in APPLIED SURFACE SCIENCE, VOLUME: 168, ISSUE: 1-4
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID | CIÊNCIAVITAE
825
TITLE: Role of ion bombardment on the properties of a-Si : H films
AUTHORS: Aguas, H ; Martins, R ; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
INDEXED IN: Scopus
IN MY: ORCID | CIÊNCIAVITAE
826
TITLE: Role of soldering parameters on the electrical performances presented by Cu-Sn-Cu joints used in power diodes  Full Text
AUTHORS: Martins, R ; Ferreira, J; Goncalves, C; Nunes, P; Fortunato, E ; Marvao, AP; Martins, JI ;
PUBLISHED: 2000, SOURCE: Joint FEMS Symposium/E-MRS Symposium H Strain in Materials: Analysis, Relatation and Properties in MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, VOLUME: 288, ISSUE: 2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID | CIÊNCIAVITAE
827
TITLE: Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique  Full Text
AUTHORS: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Symposium D - Measurement Techniques for Technological Plasmas at the 1999 E-MRS Spring Meeting in VACUUM, VOLUME: 56, ISSUE: 1
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID | CIÊNCIAVITAE
828
TITLE: Role of the gas temperature and power to gas flow ratio on powder formation and properties of films grown by the PECVD technique  Full Text
AUTHORS: Martins, R ; Silva, V; Ferreira, I ; Domingues, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Spring Meeting of the European-Materials-Research-Society in MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, VOLUME: 69
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID | CIÊNCIAVITAE
829
TITLE: Silicon films produced by PECVD under powder formation conditions
AUTHORS: Martins, R; Aguas, H ; Silva, V; Ferreira, I; Cabrita, A; Fortunato, E ;
PUBLISHED: 2000, SOURCE: 5th European Workshop on Dusty and Collidal Plasmas in PLASMA PROCESSING AND DUSTY PARTICLES, VOLUME: 382
INDEXED IN: WOS
IN MY: ResearcherID
830
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films
AUTHORS: Aguas, H ; Silva, V; Ferreira, I ; Fortunato, E ; Martins, R ;
PUBLISHED: 2000, SOURCE: International Workshop on Semiconducting and Superconducting Materials in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, VOLUME: 80, ISSUE: 4
INDEXED IN: Scopus
IN MY: ORCID | CIÊNCIAVITAE
Page 83 of 95. Total results: 950.

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