Pathways to High-Performance Extreme Ultra-Violet Lithography Resists: Dissociative Electron Attachment to Pentafluoro-Phenyl Triflate

AuthID
 P-01A-KCQ
6
Author(s)
Mendes M.
·
Tafrishi R.
·
Guerra P.
·
Holzmeier F.
·
Ingólfsson O.
·
Document Type
Article
Year published
2025
Published
in Iscience, ISSN: 2589-0042
Volume: 28, Issue: 12, Pages: 114020
Indexing
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-105022920324
Source Identifiers
ISSN: 2589-0042
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