Pathways to High-Performance Extreme Ultra-Violet Lithography Resists: Dissociative Electron Attachment to Pentafluoro-Phenyl Triflate

AuthID
 P-01A-KCQ
6
Author(s)
Mendes M.
·
Tafrishi R.
·
Guerra P.
·
Holzmeier F.
·
Ingólfsson O.
·
Tipo de Documento
Article
Year published
2025
Publicado
in Iscience, ISSN: 2589-0042
Volume: 28, Número: 12, Páginas: 114020
Indexing
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-105022920324
Source Identifiers
ISSN: 2589-0042
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2025 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service