Pathways to High-Performance Extreme Ultra-Violet Lithography Resists: Dissociative Electron Attachment to Pentafluoro-Phenyl Triflate

AuthID
 P-01A-KCQ
6
Author(s)
Mendes, M
·
Tafrishi, R
·
Guerra, P
·
Holzmeier, F
·
Ingolfsson, O
·
Tipo de Documento
Article
Year published
2025
Publicado
in ISCIENCE, ISSN: 2589-0042
Volume: 28, Número: 12, Páginas: 114020 (13)
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Scopus®
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Pubmed®
Google Scholar®
Publication Identifiers
Pubmed: 41399514
SCOPUS: 2-s2.0-105022920324
Wos: WOS:001631484500015
Source Identifiers
ISSN: 2589-0042
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