In-Situ Xrd Vs Ex-Situ Vacuum Annealing of Tantalum Oxynitride Thin Films: Assessments on the Structural Evolution

AuthID
 P-00N-PWZ
6
Author(s)
Apreutesei, M
·
Cristea, D
Document Type
Article
Year published
2018
Published
in APPLIED SURFACE SCIENCE, ISSN: 0169-4332
Volume: 438, Pages: 14-19 (6)
Conference
10Th International Conference on Materials Science and Engineering (Bramat), Date: MAR 08-11, 2017, Location: Transilvania Univ Brasov, Brasov, ROMANIA, Host: Transilvania Univ Brasov
Indexing
Wos®
Google Scholar®
Publication Identifiers
Wos: WOS:000425731200003
Source Identifiers
ISSN: 0169-4332
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service