In-Situ Xrd Vs Ex-Situ Vacuum Annealing of Tantalum Oxynitride Thin Films: Assessments on the Structural Evolution

AuthID
 P-00N-PWZ
6
Author(s)
Apreutesei, M
·
Cristea, D
Tipo de Documento
Article
Year published
2018
Publicado
in APPLIED SURFACE SCIENCE, ISSN: 0169-4332
Volume: 438, Páginas: 14-19 (6)
Conference
10Th International Conference on Materials Science and Engineering (Bramat), Date: MAR 08-11, 2017, Location: Transilvania Univ Brasov, Brasov, ROMANIA, Host: Transilvania Univ Brasov
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Publication Identifiers
SCOPUS: 2-s2.0-85032994315
Wos: WOS:000425731200003
Source Identifiers
ISSN: 0169-4332
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