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Epitaxial Ge-Rich Silicon Layers After Dry Oxidation of Ge Implanted Silicon
AuthID
P-00P-Y51
3
Author(s)
Baghizadeh, A
·
Lotfi, E
·
Agha Aligol, D
Document Type
Article
Year published
2019
Published
in
VACUUM,
ISSN: 0042-207X
Volume: 160, Pages: 311-315 (5)
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Publication Identifiers
DOI
:
10.1016/j.vacuum.2018.11.045
SCOPUS
: 2-s2.0-85057330213
Wos
: WOS:000456491300042
Source Identifiers
ISSN
: 0042-207X
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