Epitaxial Ge-Rich Silicon Layers After Dry Oxidation of Ge Implanted Silicon

AuthID
 P-00P-Y51
3
Author(s)
Lotfi, E
·
Agha Aligol, D
Document Type
Article
Year published
2019
Published
in VACUUM, ISSN: 0042-207X
Volume: 160, Pages: 311-315 (5)
Indexing
Wos®
Scopus®
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-85057330213
Wos: WOS:000456491300042
Source Identifiers
ISSN: 0042-207X
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas instituições

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service