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Assessment of Residual Stress on Thin Films by Laser Microtopography
                        AuthID
P-002-ZZ6
        P-002-ZZ6
                        2                    
                    Author(s)
                
                        2                    
                    Editor(s)
                
                RodriguezVera,R;DiazUribe,R            
        Document Type
            
            Proceedings Paper        
    Year published
                
                2011            
        Published
            in 22ND CONGRESS OF THE INTERNATIONAL COMMISSION FOR OPTICS: LIGHT FOR THE DEVELOPMENT OF THE WORLD in Proceedings of SPIE, ISSN: 0277-786X
                Volume: 8011
                                Conference
                22Nd Congress of the International Commission for Optics - Light for the Development of the World, Date: AUG 15-19, 2011, Location: Puebla, MEXICO, Sponsors: Centro Investigaciones Optica (CIO), Instituto Nacl Astrofisica, Optica Electronica (INAOE), Universidad Nacl Autonoma Mexico (UNAM), Centro Investigacion Cientifica Educacion Super Ensenada (CICESE), Consejo Nacl Ciencia Tecnologia (CONACYT), Centro Ciencias Aplicadas Desarrollo Tecnologico UNAM (CCADET-UNAM), Benemerita Universidad Autonoma Puebla, Int Commiss Opt (ICO), Opt Soc Amer (OSA), Centro Latinoamericano Fisica (CLAF), SPIE, Div Optica Sociedad Mexicana Fisica (DIVO-SMF), Int Union Pure & Appl Phys (IUPAP)
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        ISSN: 0277-786X
        
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