Assessment of Residual Stress on Thin Films by Laser Microtopography

AuthID
 P-002-ZZ6
2
Author(s)
2
Editor(es)
RodriguezVera,R;DiazUribe,R
Tipo de Documento
Proceedings Paper
Year published
2011
Publicado
in 22ND CONGRESS OF THE INTERNATIONAL COMMISSION FOR OPTICS: LIGHT FOR THE DEVELOPMENT OF THE WORLD in Proceedings of SPIE, ISSN: 0277-786X
Volume: 8011
Conference
22Nd Congress of the International Commission for Optics - Light for the Development of the World, Date: AUG 15-19, 2011, Location: Puebla, MEXICO, Patrocinadores: Centro Investigaciones Optica (CIO), Instituto Nacl Astrofisica, Optica Electronica (INAOE), Universidad Nacl Autonoma Mexico (UNAM), Centro Investigacion Cientifica Educacion Super Ensenada (CICESE), Consejo Nacl Ciencia Tecnologia (CONACYT), Centro Ciencias Aplicadas Desarrollo Tecnologico UNAM (CCADET-UNAM), Benemerita Universidad Autonoma Puebla, Int Commiss Opt (ICO), Opt Soc Amer (OSA), Centro Latinoamericano Fisica (CLAF), SPIE, Div Optica Sociedad Mexicana Fisica (DIVO-SMF), Int Union Pure & Appl Phys (IUPAP)
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Publication Identifiers
SCOPUS: 2-s2.0-84858393609
Wos: WOS:000297585800038
Source Identifiers
ISSN: 0277-786X
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