Teresa Maria Santos Ribeiro Viseu
AuthID: R-000-H60
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TÃTULO: High-rate deposition of nano-crystalline silicon thin films on plastics Full Text
AUTORES: Marins, E; Guduru, V; Ribeiro, M; Cerqueira, F ; Bouattour, A; Alpuim, P ;
PUBLICAÇÃO: 2011, FONTE: Spring Meeting of the European-Materials-Research-Society (E-MRS)/Symposium I on Advanced Silicon Materials Research for Electronic and Photovoltaic Applications II/Symposium J on Silicon-Based Nanophotonics in PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3, VOLUME: 8, NÚMERO: 3
AUTORES: Marins, E; Guduru, V; Ribeiro, M; Cerqueira, F ; Bouattour, A; Alpuim, P ;
PUBLICAÇÃO: 2011, FONTE: Spring Meeting of the European-Materials-Research-Society (E-MRS)/Symposium I on Advanced Silicon Materials Research for Electronic and Photovoltaic Applications II/Symposium J on Silicon-Based Nanophotonics in PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 3, VOLUME: 8, NÚMERO: 3
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TÃTULO: Surface properties of doped and undoped TiO2 thin films deposited by magnetron sputtering Full Text
AUTORES: Carneiro, JO ; Teixeira, V ; Martins, AJ; Mendes, M; Ribeiro, M; Vieira, A;
PUBLICAÇÃO: 2009, FONTE: 5th European Topical Conference on Hard Coating in VACUUM, VOLUME: 83, NÚMERO: 10
AUTORES: Carneiro, JO ; Teixeira, V ; Martins, AJ; Mendes, M; Ribeiro, M; Vieira, A;
PUBLICAÇÃO: 2009, FONTE: 5th European Topical Conference on Hard Coating in VACUUM, VOLUME: 83, NÚMERO: 10
3
TÃTULO: Phosphorous and boron doping of nc-Si : H thin films deposited on plastic substrates at 150 degrees C by Hot-Wire Chemical Vapor Deposition Full Text
AUTORES: Filonovich, SA ; Ribeiro, M; Rolo, AG ; Alpuim, P ;
PUBLICAÇÃO: 2008, FONTE: 4th International Conference on Hot-Wire CVD (Cat-CVD) Process in THIN SOLID FILMS, VOLUME: 516, NÚMERO: 5
AUTORES: Filonovich, SA ; Ribeiro, M; Rolo, AG ; Alpuim, P ;
PUBLICAÇÃO: 2008, FONTE: 4th International Conference on Hot-Wire CVD (Cat-CVD) Process in THIN SOLID FILMS, VOLUME: 516, NÚMERO: 5
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TÃTULO: Piezoresistive properties of nanocrystalline silicon thin films deposited on plastic substrates by hot-wire chemical vapor deposition Full Text
AUTORES: Alpuim, P ; Andrade, M; Sencadas, V ; Ribeiro, M; Filonovich, SA ; Lanceros Mendez, S ;
PUBLICAÇÃO: 2007, FONTE: 5th Symposium on Thin Films for Large Area Electronics held at the EMRS 2006 Spring Meeting in THIN SOLID FILMS, VOLUME: 515, NÚMERO: 19
AUTORES: Alpuim, P ; Andrade, M; Sencadas, V ; Ribeiro, M; Filonovich, SA ; Lanceros Mendez, S ;
PUBLICAÇÃO: 2007, FONTE: 5th Symposium on Thin Films for Large Area Electronics held at the EMRS 2006 Spring Meeting in THIN SOLID FILMS, VOLUME: 515, NÚMERO: 19
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TÃTULO: Optimization of deposition parameters for thin silicon films on flexible substrates in a hot-wire chemical vapor deposition reactor
AUTORES: Alpuim, P ; Ribeiro, M; Filonovich, S ;
PUBLICAÇÃO: 2006, FONTE: 3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) in ADVANCED MATERIALS FORUM III, PTS 1 AND 2, VOLUME: 514-516, NÚMERO: PART 1
AUTORES: Alpuim, P ; Ribeiro, M; Filonovich, S ;
PUBLICAÇÃO: 2006, FONTE: 3rd International Materials Symposium/12th Meeting of the Sociedad-Portuguesa-da-Materials (Materials 2005/SPM) in ADVANCED MATERIALS FORUM III, PTS 1 AND 2, VOLUME: 514-516, NÚMERO: PART 1
INDEXADO EM:
Scopus
WOS


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TÃTULO: Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
AUTORES: Pedro Alpuim ; Ribeiro, M; Sergej Filonovich;
PUBLICAÇÃO: 2006, FONTE: Materials Science Forum - MSF, VOLUME: 514-516
AUTORES: Pedro Alpuim ; Ribeiro, M; Sergej Filonovich;
PUBLICAÇÃO: 2006, FONTE: Materials Science Forum - MSF, VOLUME: 514-516
INDEXADO EM:
CrossRef
