Elvira Maria Correia Fortunato
AuthID: R-000-4M5
391
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
392
TITLE: Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films Full Text
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
393
TITLE: Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
394
TITLE: Plasma diagnostics of a PECVD system using different R.F. electrode configurations Full Text
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
AUTHORS: Águas, H; Martins, R; Fortunato, E;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
395
TITLE: Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films Full Text
AUTHORS: águas, H; Silva, V; Ferreira, I; Fortunato, E; Martins, R;
PUBLISHED: 2000, SOURCE: Philosophical Magazine Part B, VOLUME: 80, ISSUE: 4
AUTHORS: águas, H; Silva, V; Ferreira, I; Fortunato, E; Martins, R;
PUBLISHED: 2000, SOURCE: Philosophical Magazine Part B, VOLUME: 80, ISSUE: 4
396
TITLE: New metallurgical systems for electronic soldering applications Full Text
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
AUTHORS: Gonçalves, C; Ferreira, J; Fortunato, E; Ferreira, I; Martins, R; A.P Marvão; J.I Martins; Harder, T; Oppelt, R;
PUBLISHED: 1999, SOURCE: Sensors and Actuators A: Physical, VOLUME: 74, ISSUE: 1-3
397
TITLE: Role of the collecting resistive layer on the static characteristics of 2D a-Si : H thin film position sensitive detector
AUTHORS: Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTHORS: Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: 
WOS
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ORCID | ResearcherID
ORCID | ResearcherID398
TITLE: Performances of nano/amorphous silicon films produced by hot wire plasma assisted technique
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F ; Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F ; Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: WOS
WOS IN MY: ORCID | ResearcherID
ORCID | ResearcherID399
TITLE: Influence of the H-2 dilution and filament temperature on the properties of P doped silicon carbide thin films produced by hot-wire technique
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F; Fortunato, E; Cenimat, RM;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTHORS: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F; Fortunato, E; Cenimat, RM;
PUBLISHED: 1998, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXED IN: WOS
WOS IN MY: ORCID | ResearcherID
ORCID | ResearcherID400
TITLE: Selective optical sensors from 0.25 to 1.1 μm based on metal oxide-semiconductor heterojunctions Full Text
AUTHORS: Malik, A; Seco, A; Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Sensors and Actuators, A: Physical, VOLUME: 68, ISSUE: 1-3
AUTHORS: Malik, A; Seco, A; Fortunato, E; Martins, R;
PUBLISHED: 1998, SOURCE: Sensors and Actuators, A: Physical, VOLUME: 68, ISSUE: 1-3
INDEXED IN: 
Scopus
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