Bonding Structure and Hydrogen Content in Silicon Nitride Thin Films Deposited by the Electron Cyclotron Resonance Plasma Method

AuthID
 P-000-9VJ
10
Author(s)
Martinez, FL
·
Ruiz Merino, R
·
del Prado, A
·
San Andres, E
·
Martil, I
·
Gonzalez Diaz, G
·
Jeynes, C
·
Wang, L
·
Reehal, HS
1
Editor(es)
Hilgers H.Knoll W.Luth H.
Tipo de Documento
Article
Year published
2004
Publicado
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 459, Número: 1-2, Páginas: 203-207 (5)
Conference
8Th European Vacuum Congress (Evc-8)/2Nd Annual Conference of the German-Vacuum-Society (Dvg), Date: JUN 23-26, 2003, Location: Berlin, GERMANY, Patrocinadores: Natl Vacuum Soc, German Vacuum Soc
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Publication Identifiers
SCOPUS: 2-s2.0-2942622296
Wos: WOS:000222217100046
Source Identifiers
ISSN: 0040-6090
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