Effects of Working Pressure on Physical Properties of Tungsten-Oxide Thin Films Sputtered from Oxide Target

AuthID
 P-018-MZK
4
Author(s)
Riech I.
·
Acosta M.
·
Peña J.L.
·
Tipo de Documento
Article
Year published
2010
Publicado
in Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 07342101
Volume: 28, Número: 2, Páginas: 329-333 (4)
Indexing
Scopus®
Crossref®16
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-77949407846
Source Identifiers
ISSN: 07342101
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