Effects of Working Pressure on Physical Properties of Tungsten-Oxide Thin Films Sputtered from Oxide Target

AuthID
 P-018-MZK
4
Author(s)
Riech I.
·
Acosta M.
·
Peña J.L.
·
Document Type
Article
Year published
2010
Published
in Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, ISSN: 07342101
Volume: 28, Issue: 2, Pages: 329-333 (4)
Indexing
Scopus®
Crossref®16
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-77949407846
Source Identifiers
ISSN: 07342101
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

footer slogan

Useful Links

Get Help

© 2025 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service