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A New Omcvd Iridium Precursor for Thin Film Deposition
AuthID
P-000-W6R
6
Author(s)
Serp, P
·
Feurer, R
·
Kalck, P
·
Gomes, H
·
Faria, JL
·
Figueiredo, JL
Document Type
Article
Year published
2001
Published
in
CHEMICAL VAPOR DEPOSITION,
ISSN: 0948-1907
Volume: 7, Issue: 2, Pages: 59-62 (4)
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DOI
:
10.1002/1521-3862(200103)7:2<59::aid-cvde59>3.0.co;2-s
Scopus
: 2-s2.0-0003072387
Wos
: WOS:000167699300001
Source Identifiers
ISSN
: 0948-1907
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