Role of Trimethylboron to Silane Ratio on the Properties of P-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition

AuthID
 P-00J-00A
5
Author(s)
Bernacka-Wojcik, I
·
Tipo de Documento
Article
Year published
2010
Publicado
in Journal of Nanoscience and Nanotechnology - J. Nanosci. Nanotech., ISSN: 1533-4880
Volume: 10, Número: 4, Páginas: 2547-2551
Indexing
Crossref®
Google Scholar®
Publication Identifiers
Source Identifiers
ISSN: 1533-4880
Export Publication Metadata
Lista Marked
 Adicionar à lista Marked
Info
At this moment we don't have any links to full text documens.

Um espaço para investigadores e suas Instituições

Links Úteis

Ajuda

© 2025 CRACS & Inesc TEC - All Rights Reserved Política de Privacidade | Terms of Service