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Study of the 300-Mm Cosi2 Defects Induced by Soft Sputter Etch Process Before Cobalt Deposition - Characterization, Design of Experiment and 200/300 Mm Comparison

AuthID
P-00N-QT5

Author(s)

Humbert, A

Regnier, C

Braeckelmann, G

Basso, MT

Ferreira, P

Tipo de Documento

Proceedings Paper

Year published

2004

Publicado

in Materials Science and Engineering B: Solid-State Materials for Advanced Technology, ISSN: 0921-5107

Volume: 114-115, Número: SPEC. ISS., Páginas: 209-213

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Publication Identifiers

DOI: 10.1016/j.mseb.2004.07.079

SCOPUS: 2-s2.0-10644219548

Source Identifiers

ISSN: 0921-5107

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Study of the 300-Mm Cosi2 Defects Induced by Soft Sputter Etch Process Before Cobalt Deposition - Characterization, Design of Experiment and 200/300 Mm Comparison

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Study of the 300-Mm Cosi2 Defects Induced by Soft Sputter Etch Process Before Cobalt Deposition - Characterization, Design of Experiment and 200/300 Mm Comparison

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