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Combined In-Depth X-Ray Photoelectron Spectroscopy and Time-Of-Flight Secondary Ion Mass Spectroscopy Study of the Effect of Deposition Pressure and Substrate Bias on the Electrical Properties and Composition of Ga-Doped Zno Thin Films Grown by Magnetron Sputtering

AuthID
P-00P-NSC

Author(s)

Correia, FC

Ribeiro, JM

Salvador, PB

Welle, A

Bruns, M

Mendes, A

Tavares, CJ

Tipo de Documento

Article

Year published

2018

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 665, Páginas: 184-192 (9)

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Scopus^®

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Google Scholar^®

Publication Identifiers

DOI: 10.1016/j.tsf.2018.09.004

Handle: https://hdl.handle.net/1822/72415

SCOPUS: 2-s2.0-85053757167

Wos: WOS:000447427400028

Source Identifiers

ISSN: 0040-6090

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Combined In-Depth X-Ray Photoelectron Spectroscopy and Time-Of-Flight Secondary Ion Mass Spectroscopy Study of the Effect of Deposition Pressure and Substrate Bias on the Electrical Properties and Composition of Ga-Doped Zno Thin Films Grown by Magnetron Sputtering

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Combined In-Depth X-Ray Photoelectron Spectroscopy and Time-Of-Flight Secondary Ion Mass Spectroscopy Study of the Effect of Deposition Pressure and Substrate Bias on the Electrical Properties and Composition of Ga-Doped Zno Thin Films Grown by Magnetron Sputtering

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