Jacques Jolly
AuthID: R-006-KC6
1
TITLE: Capacitively coupled radio-frequency hydrogen discharges: The role of kinetics Full Text
AUTHORS: Marques, L ; Jolly, J; Alves, LL ;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 6
AUTHORS: Marques, L ; Jolly, J; Alves, LL ;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 6
2
TITLE: Electrical Characterization of Capacitively Coupled Radio Frequency Discharges in Hydrogen Full Text
AUTHORS: Luis S A Marques ; Jacques Jolly; Luis L Alves ;
PUBLISHED: 2007, SOURCE: PLASMA PROCESSES AND POLYMERS, VOLUME: 4, ISSUE: SUPPL.1
AUTHORS: Luis S A Marques ; Jacques Jolly; Luis L Alves ;
PUBLISHED: 2007, SOURCE: PLASMA PROCESSES AND POLYMERS, VOLUME: 4, ISSUE: SUPPL.1
3
TITLE: Systematic characterization of low-pressure capacitively coupled hydrogen discharges Full Text
AUTHORS: Salabas, A; Marques, L ; Jolly, J; Gousset, G; Alves, LL ;
PUBLISHED: 2004, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 95, ISSUE: 9
AUTHORS: Salabas, A; Marques, L ; Jolly, J; Gousset, G; Alves, LL ;
PUBLISHED: 2004, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 95, ISSUE: 9
4
TITLE: Capacitively coupled hydrogen discharges: Modeling vs. experiment
AUTHORS: Marques, L ; Jolly, J; Gousset, G; Alves, LL ;
PUBLISHED: 2004, SOURCE: 8th Thermal Plasma Processes Symposium in HIGH TEMPERATURE MATERIAL PROCESSES, VOLUME: 8, ISSUE: 4
AUTHORS: Marques, L ; Jolly, J; Gousset, G; Alves, LL ;
PUBLISHED: 2004, SOURCE: 8th Thermal Plasma Processes Symposium in HIGH TEMPERATURE MATERIAL PROCESSES, VOLUME: 8, ISSUE: 4
5
TITLE: Two-dimensional modelling of SiH4-H-2 radio-frequency discharges for a-Si : H deposition
AUTHORS: Leroy, O; Gousset, G; Alves, LL ; Perrin, J; Jolly, J;
PUBLISHED: 1998, SOURCE: PLASMA SOURCES SCIENCE & TECHNOLOGY, VOLUME: 7, ISSUE: 3
AUTHORS: Leroy, O; Gousset, G; Alves, LL ; Perrin, J; Jolly, J;
PUBLISHED: 1998, SOURCE: PLASMA SOURCES SCIENCE & TECHNOLOGY, VOLUME: 7, ISSUE: 3
